Technical Specifications | |
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Measuring principle | cold vapor atomic absorption (CVAAS) at 253.7 nm |
UV-Source | Electrodeless low pressure mercury lamp (EDL) |
Stabilization method | Reference beam method |
Optical cell | Fused silica (Suprasil), l: approx. 230mm, heated approx. 45° |
Sensitivity | 0.1 μg/m³ |
Response time | < 1 sec |
Measuring ranges | 0.1 – 100 µg / m³; 0 – 1000 µg / m³; 0 – 2000 µg / m³ |
Computation of mean values | Autom. via three freely selectable time intervals |
Data logger function | Integrated (option), for up to 15 000 measurements |